Read e-book online Acoustic Wave and Electromechanical Resonators: Concept to PDF

By Humberto Campanella

ISBN-10: 1607839776

ISBN-13: 9781607839774

ISBN-10: 1607839784

ISBN-13: 9781607839781

This groundbreaking ebook provide you with a accomplished realizing of FBAR (thin-film bulk acoustic wave resonator), MEMS (microelectomechanical system), and NEMS (nanoelectromechanical approach) resonators. For the 1st time wherever, you discover huge assurance of those units at either the expertise and alertness degrees. This functional reference provide you with assistance in layout, fabrication, and characterization of FBARs, MEMS and NEBS. It discusses the mixing of those units with average CMOS (complementary-metal-oxide-semiconductor) applied sciences, and their software to sensing and RF structures. in addition, this one-stop source appears to be like on the major features, modifications, and boundaries of FBAR, MEMS, and NEMS units, supporting you to decide on the appropriate methods to your initiatives. Over 280 illustrations and greater than a hundred thirty equations help key issues in the course of the booklet.

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Extra resources for Acoustic Wave and Electromechanical Resonators: Concept to Key Applications (Integrated Microsystems)

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L. Vossen and W. ), San Francisco, CA: Academic Press Limited, 1991, p. 178. [57] Jaeger, R. , Upper Saddle River, NJ: Prentice-Hall, 2002. html. com/. com/. com. com/. html. [64] Nippon Electric Co. jp. [65] Lyshevski, S. , Micro- and Nano-Electromechanical Systems: Fundamentals of Microand Nano-Engineering, Boca Raton, FL: CRC Press, 2000. , “Test Microstructures for Measurement of SiC Thin Film Mechanical Properties,” J. Micromech. , Vol. 9, 1999, pp. 190–193. [67] Coburn, J. , and H. F. Winters, “Ion- and Electron-Assisted Gas-Surface Chemistry: An Important Effect in Plasma Etching,” J.

Then, the mask or reticule is charged in the exposure line and aligned with the wafer. 20 Conventional optical photolithography of a SiO2 pattern: (a) SiO2 layer deposition; (b) photo-resist coating; (c) mask alignment and UV exposure; (d) resist developing; (e) SiO2 etching; and (f) resist removal. 3 Key Fabrication Technologies 29 exposed to UV radiation, the molecular structure of the light-sensitive resist is broken. After resist developing, two cases are considered, depending on whether the resist is positive or negative.

This matter and the production cycle of MEMS and NEMS resonators are studied in the next sections. 4 μm. 3 Key Fabrication Technologies The resonator fabrication technologies are the same as those used in other MEMS and NEMS device fabrication. We divide them in two categories: (1) common to IC fabrication (suitable for MEMS), and (2) nanofabrication techniques (suitable for NEMS). In both cases, MEMS and NEMS fabrication is costly in time, materials, services, equipment, and man power. Thus, the design and production infrastructures are not affordable for most of the companies or research centers.

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Acoustic Wave and Electromechanical Resonators: Concept to Key Applications (Integrated Microsystems) by Humberto Campanella


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